O 38: Semiconductor substrates: clean surfaces
Tuesday, March 23, 2010, 15:00–16:00, H40
 |
15:00 |
O 38.1 |
Angle-resolved low-energy photoemission at clean Si(111)(7x7) surface — •Wolfgang Heckel, Kerstin Biedermann, and Thomas Fauster
|
|
|
|
15:15 |
O 38.2 |
SHG Spectroscopy of Si(100)(2x1) Interband Transitions — Dominic Gerlach, Björn Braunschweig, Gerhard Lilienkamp, and •Winfried Daum
|
|
|
|
15:30 |
O 38.3 |
Cleaning of GaN(2110) surfaces by Ga deposition and desorption — •Simon Kuhr, Christian Schulz, Timo Aschenbrenner, Jan Ingo Flege, Thomas Schmidt, Detlef Hommel, and Jens Falta
|
|
|
|
15:45 |
O 38.4 |
The role of Hydrogen for the formation of the GaP(001) surface — •Marcel Ewald, Michael Kneissl, Norbert Esser, and Patrick Vogt
|
|
|
