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O: Fachverband Oberflächenphysik

O 38: Semiconductor substrates: clean surfaces

Dienstag, 23. März 2010, 15:00–16:00, H40

15:00 O 38.1 Angle-resolved low-energy photoemission at clean Si(111)(7x7) surface — •Wolfgang Heckel, Kerstin Biedermann, and Thomas Fauster
15:15 O 38.2 SHG Spectroscopy of Si(100)(2x1) Interband TransitionsDominic Gerlach, Björn Braunschweig, Gerhard Lilienkamp, and •Winfried Daum
15:30 O 38.3 Cleaning of GaN(2110) surfaces by Ga deposition and desorption — •Simon Kuhr, Christian Schulz, Timo Aschenbrenner, Jan Ingo Flege, Thomas Schmidt, Detlef Hommel, and Jens Falta
15:45 O 38.4 The role of Hydrogen for the formation of the GaP(001) surface — •Marcel Ewald, Michael Kneissl, Norbert Esser, and Patrick Vogt
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DPG-Physik > DPG-Verhandlungen > 2010 > Regensburg