Regensburg 2010 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 59: Poster Session II (Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: arrays; Nanostructures at surfaces: Wires, tubes; Nanostructures at surfaces: Other; Plasmonics and nanooptics; Metal substrates: Epitaxy and growth; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsoprtion of organic / bio molecules; Metal substrates: Adsoprtion of inorganic molecules; Metal substrates: Adsoprtion of O and/or H; Metal substrates: Clean surfaces; Density functional theory and beyond for real materials)
O 59.70: Poster
Mittwoch, 24. März 2010, 17:45–20:30, Poster B1
Electrospray Ion Beam Deposition of Molecules and Nanoparticles — •Gordon Rinke1, Nicha Thontasen1, Zhitao Deng1, Nikola Malinowski1, Stephan Rauschenbach1, and Klaus Kern1,2 — 1Max Planck Institute for Solid State Research, Heisenbergstrasse 1, 70569 Stuttgart, Germany — 2Institut de Physique de la Matiere Condensee, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland
The vacuum deposition of complex molecules and nanoparticles is an important technological step towards applications, for instance in molecular devices or as surface functionalization. Vacuum based processing assures well defined and clean structures in contrast to deposition under ambient conditions or from solution. A possibility to deposit non-volatile particles is given by electrospray ion beam deposition (ES-IBD) [1]. In-situ sample preparation, beam preparation, and sample analysis by scanning tunneling microscopy (STM) allows full control over all deposition parameter [2]. Here, we present recent results of the deposition of molecules and nanoparticles by ES-IBD. We demonstrate the control of coverage, cleanliness, deposition energy, and beam composition and give examples for the in-situ characterization by STM.
[1] Small 2 (2006), 540-547
[2] ACS Nano 3 (2009), 2901