O 82: Graphene IV
  Freitag, 26. März 2010, 11:15–13:00, H31
  
    
  
  
    
      
        
          
            
              |  | 11:15 | O 82.1 | Spin-Splitting of Graphene/Au/SiC investigated with Spin- and Angle-Resolved Photoemission Spectroscopy — •Isabella Gierz, Fabian Meier, Bartosz Slomski, Jan Hugo Dil, Jürg Osterwalder, Christian R. Ast, and Klaus Kern | 
        
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              |  | 11:30 | O 82.2 | High Resolution Electron Energy Loss Spectroscopy on Graphene/SiC(0001) — •Roland J. Koch, Michael Endlich, Thomas Haensel, Syed Imad-U. Ahmed, Thomas Seyller, and Juergen A. Schaefer | 
        
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              |  | 11:45 | O 82.3 | AFM imaging of graphene under ambient conditions — •Michael Enzelberger, Viatcheslav Dremov, Florian Speck, Catharina Knieke, Angela Berger, Thomas Seyller, Wolfgang Peukert, and Paul Müller | 
        
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              |  | 12:00 | O 82.4 | Low Temperature Epitaxial Graphene on SiC by Carbon Deposition — •Ameer Al-Temimy, Christian Riedl, and Ulrich Starke | 
        
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              |  | 12:15 | O 82.5 | Quasi-freestanding Graphene on SiC(0001) — •Florian Speck, Markus Ostler, Jonas Röhrl, Johannes Jobst, Daniel Waldmann, Martin Hundhausen, Lothar Ley, Heiko B. Weber, and Thomas Seyller | 
        
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              |  | 12:30 | O 82.6 | Crystal Symmetry and Stress in Epitaxial Graphene Films — •Diedrich Schmidt and Taisuke Ohta | 
        
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              |  | 12:45 | O 82.7 | Plasmons in epitaxial graphene: influence of steps and doping concentration — •Thomas Langer, Herbert Pfnür, Christoph Tegenkamp, and Hans Werner Schumacher | 
        
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