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Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 7: Layer Properties: Electrical, Optical and Mechanical Properties

Montag, 14. März 2011, 17:45–19:30, GER 37

17:45 DS 7.1 Ink-jet printing of silver tracks on porous surfaces and improvement of conductivity — •Anna Schuppert, Joachim Wollschläger, Lorentz Walder, and Wolfgang Schmidt
18:00 DS 7.2 Statistical Analysis of Computer-simulated On-Chip Interconnect Electromigration Lifetimes under the Influence of Microstructure and Strengthened Top Interface — •Matthias Kraatz, Lijuan Zhang, Dieter Schmeisser, Ehrenfried Zschech, and Paul S. Ho
18:15 DS 7.3 Entwicklung eines Messverfahrens zur Bestimmung der elektrostriktiven Konstante von dünnen Polymerschichten — •Christian Schirrmann, Kirstin Bornhorst und Florenta Costache
18:30 DS 7.4 Charging of internal interfaces in metal-insulator-metal heterosystems by low energy electron beams — •Johannes Hopster, Marika Schleberger, Andreas Wucher, and Detlef Diesing
18:45 DS 7.5 Mapping of internal photoemission in metal–insulator–metal heterosystemsDominik Differt, Walter Pfeiffer, and •Detlef Diesing
19:00 DS 7.6 Determination of the electrically active Al fraction in Al doped ZnO grown by pulsed reactive magnetron sputtering — •Steffen Cornelius, Mykola Vinnichenko, Frans Munnik, René Heller, Andreas Kolitsch, and Wolfhard Möller
19:15 DS 7.7 Ellipsometric study of copper growth on silicon — •Francisc Haidu, Ovidiu D. Gordan, and Dietrich R. T. Zahn
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