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Kiel 2011 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 17: Poster: Plasmatechnologie

P 17.12: Poster

Mittwoch, 30. März 2011, 16:30–18:30, Foyer

Kinetic Monte Carlo simulations of cluster growth, diffusion and coalescence of metal atoms on a polymer substrat — •Lasse Rosenthal1, Alexei Filinov1, Michael Bonitz1, Franz Faupel2, and Vladimir Zaporojtchenko21Institut für Theoretische Physik und Astrophysik, Christian-Albrechts Universität Kiel — 2Institut für Materialwissenschaft - Materialverbunde, Christian-Albrechts Universität Kiel

Metalized polymers offer a broad range of applications in many fields of technology[1]. Therefore a detailed understanding of metal atom deposition and the underlying processes processes is required.

We present a kinetic Monte Carlo approach to a model of diffusion and the growth of metal clusters on a polymer substrate including coalescence and percolation effects[2]. The time development of the diffusion process and the dependence of characteristic parameters like the cluster size distribution and the concentration profiles on the surface diffusivity and the deposition rate of the metal atoms are presented and discussed.

[1] F. Faupel, V. Zaporojtchenko et al., Contrib. Plasma Phys. 47, No. 7, 537 (2007)

[3] G. Jeffers, M. A. Dubson and P. M. Duxbury, J. Appl. Phys. 75 5016 (1994)

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