Kiel 2011 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 8: Poster: Staubige Plasmen: Experiment und Diagnostik

P 8.9: Poster

Dienstag, 29. März 2011, 17:00–19:00, Foyer

Influence of thin film on the electrical properties of pulsed plasmas — •Brankica Sikimić, Ilija Stefanović, and Jörg Winter — Institute for Experimental Physics II, Ruhr University Bochum, Germany

Dynamics of ion densities in pulsed complex plasmas have been previously studied by the analysis of DC bias voltage on the electrodes. The ion densities have been deduced from the change of the electrode DC bias voltage in the plasma afterglow measured by the external LC filter. Simultaneous measurements of electron density by microwave interferometry have been performed. In the plasmas that contain highly reactive gas such as acetylene, a thin film of hydrocarbon deposits on electrodes and walls of the reactor. The dust particles produced by acetylene polymerization can also be included in the thin film. It has been noticed that the growth of thin film on the electrodes influences the measured DC bias voltages and particle densities. The DC bias voltage decreases when the thickness of the thin film grows, since the positive ions current to the electrode is smaller. Still, change of DC electrode voltage increases, as well as the discharging time of the capacitance of LC filter. The electron density decay time in the plasma afterglow follows the change of capacitance discharging time in the same manner. In this work the impact of the thickness of the thin film on the diffusion of electrons and positive ions is discussed. Support/acknowledgment: DFG WI1700/3, Research Department *Plasmas with Complex Interactions*