Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 27: Thin film characterization: structure analysis and composition (post growth analysis XRD, etc..)
DS 27.3: Vortrag
Mittwoch, 28. März 2012, 17:00–17:15, H 2032
X-ray Resonant Reflectivity study of Transition Metal Oxides — •Sebastian Macke1, Jorge Hamann-Borrero2, Abdullah Radi3, Ronny Sutarto4, George Christiani1, Gennady Logvenov1, George Sawatzky3, Bernhard Keimer5, and Vladimir Hinkov1 — 1Max-Planck-UBC Centre for Quantum Materials, Vancouver, Canada — 2Leibniz Institute for Solid State and Materials Research Dresden, Dresden — 3University of British Columbia, Vancouver, Canada — 4Canadian Light Source, Saskatoon, Canada — 5Max Planck Institute for Solid State Research, Stuttgart
X-ray resonant reflectometry (XRR) is the ideal tool to study the depth resolved and element-specific electronic structure of multilayer films. Besides of the structural parameters of the thin film like thickness and roughness one is sensitive to the optical constants which includes effects like magnetic profiles, element density profiles, electronic reconstruction [1] and strain effects. By changing angle, energy and polarization of the incoming beam reflectivity maps can be measured leading in principle to an accurate picture of the depth resolved electronic states of thin films. Due to the complex physics of reflectometry this measurement method needs sophisticated tools to analyze the results quantitatively. In this work the issues arising with this method are addressed and discussed. It can be shown by fitting a simple system of a one layer system of PrNiO3 grown on an LSAT substrate that one can obtain from the maps the optical constants of the layers and the element specific density profiles.
[ 1 ] E. Benckiser et. al., Nature Materials 10, 189 (2011)