Regensburg 2013 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.11: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Designing Si surface nanopatterns by low energy ion beams with metal surfactant sputtering — •Kun Zhang, Omar Bobes, and Hans Hofsäss — II. Physikalisches Institut, Universität Göttingen, Germany

Low energy ion sputtering can produce large area periodic self-organized surface nanostructures with potential applications. Recently we have demonstrated that metallic surfactants induce pronounced dot and ripple patterns on Si substrates during normal ion incidence sputter erosion. In the absence of metal co-deposition, uniform flat surfaces are obtained. We have shown that the produced surface nano-patterns strongly depend on the ion fluence and the deposition ratio, and their wave vectors are always parallel to the deposition direction. Based on these achievements, we further develop in this work the surfactant sputtering technique to produce self-organized surface nanostructures on Si with well defined symmetry, such as 4-fold, 5-fold or 6-fold symmetric dot nano patterns. In our experiments Si substrates were irradiated with 1 keV Ar ions at normal incidence and ion fluences up to 2.5x1018 ions /cm2 under continuous deposition of Fe atoms coming from a few Fe sputtering targets around the Si substrates with a certain geometrical arrangement.