Regensburg 2013 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.19: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Fabrication, characterisation and optimization of liquid alloy ion sources for nano structuring and lithography — •Michael Kwiatek¹, Rüdiger Schott¹, Paul Mazarov², and Andreas D. Wieck¹ — ¹Ruhr-Universität Bochum — ²Raith GmbH, Dortmund

Focussed Ion Beam (FIB) and ion lithography systems are tools gaining more attention in R&D and industrial applications. The source material mostly used in those systems is Gallium (Ga). But for common applications one need other implantation materials like Silicon (Si) or Gold (Au) that are electrical interesting and for some applications important - bio compatible. Furthermore materials with a low atomic weight (a.w.) are interesting for less destructive and sharper imaging with the FIB column. So there started a trend to non-Ga-FIBs in the past few years. Our solution to this problem are Liquid Alloy Ion Sources (LAIS) containing not only one but 2 to 3 different materials in one alloy which's composition is picked in an eutectic point for a relative low melting point. Those sources require a mass filter in the beam column but the new possibilities outweight that as you have an emission stable source that contains e.g. a good sputtering material (high a.w.) and a good imaging material (low a.w.) that can be used without changing the source. This brings a field of new possibilities and usages. We optimized an AuSiLi and an AuSiBe ternary source for sputtering-implanting-imaging purpose to get in the emission stability regions of pure Ga sources.