Regensburg 2013 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 11: Poster Session I: Application of thin films; Ion beam induced surface patterns; Ion and electron beam induced processes; Micro- and nanopatterning (jointly with O)

DS 11.5: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Nanosecond time-resolved temperature measurements — •Johann Berres, Elke Scheer, Paul Leiderer, and Johannes Boneberg — Department of Physics, University of Konstanz, Germany

Temperature evolution is studied in a thin silicon film after heating with a ns-laser pulse. For that purpose the reflectivity of a cw-laser is measured. Due to changes of the dielectric constants with temperature the interference conditions in the thin silicon film and thus the reflectivity vary, which allows the determination of the temperature with ns time-resolution. The measurements are compared with heat flow simulations. Finally examples for temperature evolution in samples which are illuminated by an interference pattern are shown.