Regensburg 2013 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 9: Ion and Electron Beam Induced Processes
DS 9.1: Vortrag
Montag, 11. März 2013, 16:15–16:30, H8
Sputtering effects on ion irradiated Au nanoparticles — •Henry Holland-Moritz1, Christian Borschel1, Sebastian Scheeler2, Claudia Pacholski2, and Carsten Ronning1 — 1Institut für Festkörperphysik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena — 2Max-Planck-Institut für Intelligente Systeme, Heisenbergstrasse 3, 70569 Stuttgart
Today, nanoparticles can easily be fabricated by different physical and chemical processes and can also be arranged in many different patterns and shapes. However, the synthesis is usually restricted to thermally equilibrium conditions. Ion beam irradiation, a non-equilibrium method, is one possible subsequent approach to tune the properties of nanoparticles. An important effect in this case is sputtering, especially when the ion range in the nanoparticles material is in the range of its size. For different purposes, it is important to understand the quantity of the sputtering effects on nanoparticles and how sputtering works on nanoparticles on top of substrates due to enhanced sputtering in nanostructures compared to bulk-like structures or films. Simulations were done by the Monte-Carlo-code iradina and hexagonal arranged gold nanoparticles with diameters of 50 nm on top of silicon substrates with native oxide layer were irradiated by argon ions using energies from 20 keV up to 350 keV and different ion fluencies. The sputtering effects were investigated with SEM and AFM measurements to get information about the energy dependence of the sputteryield and the fluence dependence of the volume decrease of the nanoparticles and the results were compared with the simulation results by iradina.