Berlin 2014 – wissenschaftliches Programm
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Q: Fachverband Quantenoptik und Photonik
Q 8: Laser development and applications II
Q 8.3: Vortrag
Montag, 17. März 2014, 14:30–14:45, DO26 207
Characterization and laser operation of PLD grown Yb3+: Y2O3 films — •Sven H. Waeselmann1, Sebastian Heinrich1, Kolja Beil1, Katherine A. Sloyan2, Robert W. Eason2, Christian Kränkel1,3, and Günter Huber1,3 — 1Institut für Laser-Physik, Universität Hamburg — 2Optoelectronics Research Centre, University of Southampton — 3The Hamburg Centre for Ultrafast Imaging
Pulsed Laser Deposition (PLD) is a well established method to grow thin, single crystalline films. In this method the ionic particles in a laser induced plasma are deposited on the surface of a crystalline substrate. Due to the high energy of the ionic plasma particles epitaxial growth and high film quality can be achieved. Additionally the PLD allows for the growth of materials which are difficult or impossible to synthezise with conventional crystal growth methods. Thin films of 3 at. % Yb3+ doped Y2O3 were deposited on single crystalline Y2O3 substrates. In situ electron diffraction (RHEED) analysis has been used to investigate the crystal structure during film growth. The intensity oscillations of the observed RHEED reflexes imply layer by layer growth. The RHEED pattern of the 1 µm thick film indicates epitaxial film growth. In order to use PLD grown films as active thin disk material a film thickness of several ten µm is necessary for sufficent absorption of the pumplight. Laser operation was observed with a 30 µm thick Yb(5 at. %):Y2O3 film in a thin disk laser setup with 24 pumplight passes through the gain material. A maximum output power of 60 mW was achieved with 0.8 % outcoupling at a wavelength of 1033 nm.