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P: Fachverband Plasmaphysik

P 6: Low Pressure Plasmas I

Montag, 18. März 2019, 16:30–18:30, HS 20

16:30 P 6.1 Hauptvortrag: Plasmas in leading-edge semiconductor device fabrication: Importance and analysis — •Sven Zimmermann, Micha Haase, Norbert Lang, Henrik Zimmermann, Jürgen Röpcke, Stefan Schulz, and Thomas Otto
17:00 P 6.2 Spectra of the planar Multipole Resonance Probe determined by a Kinetic Model — •Michael Friedrichs and Jens Oberrath
17:15 P 6.3 Determination of the EEDF by a Langmuir probe AC technique in low pressure ICPs — •Adrian Heiler, Roland Friedl, and Ursel Fantz
17:30 P 6.4 The absolute calibration of an energy-selective mass spectrometer with the reference IVDF from a 1D PIC simulation of a symmetrical RF plasma — •Christian Schulze, Hanno Kählert, Michael Marsand, and Jan Benedikt
17:45 P 6.5 Operation of INCA with molecular gases — •Christian Lütke Stetzkamp, Philipp Ahr, Tsanko Vaskov Tsankov, and Uwe Czarnetzki
18:00 P 6.6 Phase resolved optical properties of magnetized transient plasma created by a low-pressure dielectric barrier discharge jet — •Roman Bergert and Slobodan Mitic
18:15 P 6.7 Measurements of VUV/UV photon fluxes in planar ICP discharges at low pressure — •Caecilia Fröhler, Roland Friedl, Stefan Briefi, and Ursel Fantz
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DPG-Physik > DPG-Verhandlungen > 2019 > München