Dresden 2020 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 35: Poster Session - Tribology: Surfaces and Nanostructures
O 35.5: Poster
Montag, 16. März 2020, 18:15–20:00, P1C
Atomic Scale Mechanisms in Nanoindentation and Scratching of MoS2 — Azad Kirsan, •Mattis Gossler, Florian Wullschläger, and Bernd Meyer — Interdisciplinary Center for Molecular Materials and Computer-Chemistry-Center, FAU Erlangen-Nürnberg
Molybdinum disulfide (MoS2) as a 2D layered material is a very efficient solid lubricant which can be also applied under extreme conditions, for example, in vacuum. To obtain first insights into deformation and degradation mechanisms at high loads, we performed atomistic simulations of nanoindentation and scratching of MoS2 thin films. For the plastically deformed and ruptured MoS2 layers we analyze the changes in the chemical bonding pattern of the Mo and S atoms. The results are compared to amorphous structures obtained by ab initio molecular dynamics simulations in order to evaluate the reliability of our applied atomistic potential.