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Dresden 2020 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 36: 2D Materials and their Heterostructures I (joint session DS/HL/O)

Dienstag, 17. März 2020, 09:30–11:30, CHE 89

09:30 O 36.1 Plasma-enhanced atomic layer deposition of AlN at 40C for encapsulation and dielectric integration of 2D materials — •Michele Bissolo, Alex Henning, Theresa Grünleitner, and Ian D. Sharp
09:45 O 36.2 Spin-Sensitive Readout of Two-Dimensional Wigner Crystals in Transition-Metal Dichalcogenides — •Johannes Knörzer, Martin Schuetz, Geza Giedke, Dominik Wild, Kristiaan de Greve, Richard Schmidt, Mikhail Lukin, and Ignacio Cirac
10:00 O 36.3 Growth of ultra-thin large sized 2D WS2 flakes in at air-liquid interface — •Talha Nisar, Torsten Balster, Ali Haider, and Veit Wagner
10:15 O 36.4 Electrical Properties and Doping effects of Chemical Vapor Deposition Growth Layered MoS2 Transistor on Different Back gate oxide Substrates — •Ying-Chun Shen and Yu-Lun Chueh
10:30 O 36.5 Optical properties of TMDC monolayers interfaced with 2D metals — •Katharina Nisi, Shruti Subramanian, Florian Sigger, Margaux Lassaunière, David O. Tiede, Hendrik Lambers, Alexander Holleitner, Joshua Robinson, and Ursula Wurstbauer
10:45 O 36.6 Rigid Band Shifts in Two-Dimensional Semiconductors through External Dielectric Screening — •Malte Rösner, Lutz Waldecker, Archana Raja, Christina Steinke, Aaron Bostwick, Roland J. Koch, Chris Jozwiak, Takashi Taniguchi, Kenji Watanabe, Eli Rotenberg, Tim O. Wehling, and Tony F. Heinz
11:00 O 36.7 Unveiling valley lifetimes of free charge carriers in monolayer WSe2 — •Manfred Ersfeld, Frank Volmer, Lars Rathmann, Luca Kotewitz, Maximilian Heithoff, Mark Lohmann, Bowen Yang, Kenji Watanabe, Takashi Taniguchi, Ludwig Bartels, Jing Shi, Christoph Stampfer, and Bernd Beschoten
11:15 O 36.8 Superconducting Properties of MXene Monolayers — •Cem Sevik, Jonas Bekaert, and Milorad Milosevic
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