Dresden 2020 – wissenschaftliches Programm
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O 56.5: Poster
Dienstag, 17. März 2020, 18:15–20:00, P2/2OG
Fullerene arrangement by vapor deposition on a well-ordered thin Al2O3 film grown on Ni3Al (111) crystal — •Alexander Kononov and Heinz Hövel — Fakultät Physik / DELTA, Technische Universität Dortmund, 44227 Dortmund, Germany
A thin (∼0.5nm) Al2O3 film on a Ni3Al(111) surface that shows an well-ordered network structure in STM at a tunneling voltage of 3.2V presents a corresponding dot structure formation at 2.0V. The dot structure acts as nucleation pattern when metal islands are grown by atom deposition . For mass-selected Cu clusters it provides thermal stabilization and a specific arrangement of the clusters with respect to the dot structure . This initial situation offers a huge potential for film oxide functionalization with different mass-selected clusters. Due to its easy fabrication, fullerenes (C60) with their properties represent a model system for the metal clusters (e.g. Pb-Clusters), which are planned to be used for future experiments in our surface science facility. We present experimental UPS and STM results for vapor-deposited submonolayers of C60 on the surface of well-ordered Al2O3/Ni3Al(111), which show different behavior (e.g. shift in UPS spectrum, island growth in STM images) for different surface temperatures during vapor deposition.
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