Regensburg 2022 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 42: 2D Materials 6 (joint session HL/CPP/DS)

HL 42.9: Vortrag

Freitag, 9. September 2022, 11:45–12:00, H36

Controlled Encapsulation of Monolayer MoS2 with Ultrathin Aluminium Oxide for Tunnel Contacts — •Sergej Levashov, Chenjiang Qian, Theresa Grünleitner, Jon J. Finley, Alex Henning, and Ian D. Sharp — Walter Shottky Institut, TUM, München, Deutschland

Two-dimensional (2D) semiconductors have unique optoelectronic properties that provide the opportunity to overcome current scaling and performance limits of semiconductor devices. To harness the full of potential of 2D materials, requires their seamless integration with bulk materials. In particular, contacting mono- and few-layer 2D semiconductors with metals is challenging since the deposition process may introduce defects impeding interfacial charge transport. Here we use low-temperature atomic layer deposition to encapsulate monolayer MoS2 with a van der Waals bonded and ultrathin aluminium oxide (AlOx) layer. The 18 Å thin AlOx coating introduces additional charge carriers (∼5·1012 cm−2), while it also protects monolayer MoS2 from defect creation during metallization. Microscratching of the AlOx adlayer by contact mode atomic force microscopy and subsequent spectroscopic analysis demonstrate the reversibility of the charge transfer doping effect, indicating weak interaction. Importantly, current voltage measurements yielded a two-fold reduction in the contact resistance for MoS2 field-effect transistors contacted with AlOx interlayer. Overall, this work demonstrates the beneficial effect of the AlOx adlayer for improving 2D device contacts and provides a scalable route to the damage-free integration of 2D semiconductors.

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