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15:00 |
O 10.1 |
Investigation of geometrical properties of NiMnSb-Half-Heusler thin films by X-ray reflectivity measurements. — •Andreas Stahl, Christian Kumpf, and Eberhard Umbach
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15:15 |
O 10.2 |
Morphology of ultrathin manganese silicide films on Si(001) and Si(111) substrates — •Mahbube Hortamani, Peter Kratzer, and Matthias Scheffler
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15:30 |
O 10.3 |
In/Si(111): Chain structure and metal-insulator transition — •Andrey Stekolnikov, Jürgen Furthmüller, and Friedhelm Bechstedt
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15:45 |
O 10.4 |
Optical properties of the Si(113) 3×2 ADI surface — •Katalin Gaal-Nagy
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16:00 |
O 10.5 |
Investigation of the System Hafnium/Silicon(100) by means of XPS and X-ray Photoelectron Diffraction (XPD) — •C. Fluechter, D. Weier, S. Dreiner, M. Schürmann, U. Berges, M.F. Carazzolne, A. de Siervo, R. Landers, G.G. Kleiman, C. Westphal, and E. Henschel
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16:15 |
O 10.6 |
Photothermal patterning of H-terminated silicon substrates: Writing nanostructures with a micron-sized laser beam — •Rafael Bautista, Thorsten Balgar, Steffen Franzka, Nils Hartmann, and Eckart Hasselbrink
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16:30 |
O 10.7 |
Photothermally induced dehydroxylation on surface-oxidized silicon substrates: A simple means for the fabrication of submicron-structured hydrophilic/hydrophobic templates — •Nils Hartmann, Thorsten Balgar, Steffen Franzka, and Eckart Hasselbrink
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16:45 |
O 10.8 |
Sum-frequency generation study of hydrogen diffusion on vicinal Si(100) surfaces induced by resonant IR laser excitation — •Xu Han, Kristian Laß, and Eckart Hasselbrink
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17:00 |
O 10.9 |
MOMBE growth of ZnO on SiC - a photoemission study — •Stefan Andres, Christian Pettenkofer, and Thomas Seyller
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17:15 |
O 10.10 |
RF-sputtered indium-tin-oxynitride films investigated by photoelectron spectroscopy — •Marcel Himmerlich, Maria Koufaki, Manolis Sifakis, Stefan Krischok, Elias Aperathitis, and Juergen A. Schaefer
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17:30 |
O 10.11 |
XPS and XPD studies on the system Hafnium(oxide) on Si(100) using soft x-rays — •D. Weier, C. Flüchter, S. Dreiner, M. Schürmann, U. Berges, M.F. Carazzolne, A. Pancotti, R. Landers, G.G. Kleiman, C. Westphal, and E. Henschel
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