Kiel 2011 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

P: Fachverband Plasmaphysik

P 12: Plasmatechnologie I

P 12.5: Vortrag

Mittwoch, 30. März 2011, 11:45–12:00, HS H

Pulse magnetron sputtering of oxide films for mechanical, biomedical and optical applications — •Heidrun Klostermann — Fraunhofer Institut für Elektronenstrahl- und Plasmatechnik, Dresden, Deutschland

Reactive pulse magnetron sputtering is a versatile technique for the deposition of oxide coatings. Applications of such coatings cover optical interference functions, bioactivity as well as scratch and wear protection. The parameters pulse mode, pulse frequency, and the choice of reactive working point essentially determine the plasma conditions during film formation.

Aluminum oxide and titanium oxide are two examples of multifunctional materials whose properties can be tailored by the choice of deposition conditions and pulse parameters. Whereas amorphous films are suitable to build optical multilayer coatings, crystalline alumina is used as a wear resistant coating on high speed cutting tools, where synthesis of gamma phase alumina by pulsed reactive sputtering is mastered in production scale. However, the high-temperature stable alpha phase is desirable to avoid phase transformation in the cutting process. As to titanium oxide, the synthesis of single phase anatase is required to achieve optimum photocatalytic properties. Although empirical optimization of such tailored phase formation has reached a high level, the interrelation between fundamental processes in the pulsed reactive plasmas and nucleation and growth of the films is fragmentary.