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Verhandlungen
DPG

Berlin 2018 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 5: Layer Deposition (ALD, MBE, Sputtering, ...)

Montag, 12. März 2018, 11:45–13:15, H 0111

11:45 DS 5.1 Atomic Layer Deposition of Titanium Nitride Thin Films for Plasmonic Applications — •Gül Dogan, Umut T. Sanli, Gisela Schütz, and Kahraman Keskinbora
12:00 DS 5.2 Atomic Layer Deposition of Iridium: Nucleation and Film Growth — •Paul Schenk and Adriana Viorica Szeghalmi
12:15 DS 5.3 Energy and mass selective ion beam assisted epitaxy for deposition of thin nitride films — •Philipp Schumacher, Michael Mensing, Jürgen W. Gerlach, Stephan Rauschenbach, and Bernd Rauschenbach
12:30 DS 5.4 Modifying the texture of epitaxially grown chalcogenide thin films — •Marc Pohlmann, Marvin Kaminski, and Matthias Wuttig
12:45 DS 5.5 Deposition-Flux dependent Intrinsic Film Stress: Scaling — •Marcel Rost, Andreas Jamnig, Clarisse Furgeaud, and Gregory Abadias
13:00 DS 5.6 Aluminum nitride films prepared by plasma atomic layer deposition using different plasma sourcesMałgorzata Kot, Franziska Naumann, Samiran Garain, Emilia Poźarowska, Hassan Gargouri, •Karsten Henkel, and Dieter Schmeißer
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DPG-Physik > DPG-Verhandlungen > 2018 > Berlin