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Erlangen 2018 – scientific programme

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P: Fachverband Plasmaphysik

P 13: Low Pressure Plasmas - Poster

Tuesday, March 6, 2018, 16:15–18:15, Redoutensaal

16:15 P 13.1 Electron Impact Excitation of Xenon — •Dirk Luggenhölscher, Uwe Czarnetzki, Oleg Zatsarinny, and Klaus Bartschat
16:15 P 13.2 Spectroscopic investigations of the silyl radical using a quantum cascade laserAndy S. C. Nave, Andrei V. Pipa, Paul B. Davies, Jürgen Röpcke, and •Jean-Pierre H. van Helden
16:15 P 13.3 Diagnostics on a hollow cathode glow discharge by means of a retarding field analyser and a calorimetric probe — •Lisa Anna-Maria Bauer, Fabian Haase, Sven Gauter, and Holger Kersten
16:15 P 13.4 Experimental studies of momentum transfer during sputtering with interferometric force probes — •Mathis Klette, Thomas Trottenberg, and Holger Kersten
16:15 P 13.5 Quantum kinetic theory of ion-induced secondary electron emission from surfacesMathias Pamperin, •Franz Xaver Bronold, and Holger Fehske
16:15 P 13.6 Untersuchungen zur Trichterkompression von Plasmen koaxialer Beschleuniger — •Thomas Manegold, Parysatis Tavana, Christian Benzing, Marcus Iberler und Joachim Jacoby
16:15 P 13.7 Characterization of a portable measurement device for the determination of absolute VUV emission of low pressure plasmas — •Caecilia Fröhler, Roland Friedl, Stefan Briefi, and Ursel Fantz
16:15 P 13.8 Protective coating for electronic assemblies against environmental influences - a high throughput low pressure plasma process for in-line integrationFabian Utzmann, •Florian Eder, and Bastian J. M. Etzold
16:15 P 13.9 Application of an AC method for measuring the EEDF in low pressure plasmas by a Langmuir probe — •Adrian Heiler, Roland Friedl, and Ursel Fantz
16:15 P 13.10 Investigation of a low pressure microwave plasma source for high rate etching — •Steffen Riegger, Andreas Schulz, Matthias Walker, Günter Tovar, Mario Dünnbier, and Klaus Baumgärtner
16:15 P 13.11 Plasma enhanced chemical vapour deposition and plasma etch challenges for technological fabrication of silicon nitride photonic components — •Erik Lehmann, Harald Richter, Mirko Fraschke, Marco Lisker, Thomas Grabolla, Lars Zimmermann, and Andreas Mai
16:15 P 13.12 Structural Characterization of VOx deposited by Plasma Ion Assisted Electron Beam Evaporation for Energy Storage Application — •Miguel Dias, Anna Frank, Stefan Hieke, Simon Fleischmann, Jens Harhausen, Rüdiger Foest, Volker Presser, Christina Scheu, and Angela Kruth
16:15 P 13.13 An optically trapped microparticle as a probe — •Viktor Schneider and Holger Kersten
  16:15 P 13.14 The contribution has been withdrawn.
16:15 P 13.15 Production of a high-density plasma channel for laser acceleration — •Daiyu Hayashi und Tatsuo Shoji
  16:15 P 13.16 The contribution has been withdrawn.
16:15 P 13.17 Ellipsometric Analysis of Nanostructures in Thin SiO2-Films — •Rahel Buschhaus, Carles Corbella, and Achim von Keudell
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