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HL: Fachverband Halbleiterphysik
HL 30: Poster I
HL 30.8: Poster
Dienstag, 17. März 2020, 13:30–15:45, P3
Electrical characterization of p-conductive transparent copper iodide thin films deposited by PLD — •Michael Bar, Philipp Storm, Holger von Wenckstern, Chang Yang, Michael Lorenz, and Marius Grundmann — Universtät Leipzig, Germany
Copper iodide (CuI) is a p-type, wide-bandgap semiconductor which unites transparency in the visible spectral range with exceptional hole conductivity. This makes CuI a viable candidate for various transparent electronic devices such as diodes and field-effect transistors. In recent years, sputtered CuI heterojunctions have been presented [1]. However, practical challenges regarding the growth of epitaxial films remain before CuI can be employed into TFTs.
In this contribution we present electrical properties of CuI thin films which were prepared by pulsed laser deposition. The electrical characterization of these films was performed using current-voltage and Hall measurements. Remarkable properties of these films are for example hole carrier densities in the order of 1017 cm−3 and a hole mobility of 10 cm2/Vs.
[1] C. Yang et al., Sci. Rep., 6(1), 21937, (2016).