DPG Phi
Verhandlungen
Verhandlungen
DPG

Dresden 2009 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 11: Layer Growth: Evolution of Structure and Simulation

Dienstag, 24. März 2009, 14:00–16:00, GER 37

14:00 DS 11.1 Material dependent smoothing of rippled surfaces — •Johanna Röder and Hans-Ulrich Krebs
14:15 DS 11.2 Stacking fault suppression in ion assisted growth of Ir on Ir(111) — •Sebastian Bleikamp and Thomas Michely
14:30 DS 11.3 Ion induced Burying Effect of Au Nanoparticles on SiO2: Influence of SputteringA. Klimmer, M. Trautvetter, B. Kuerbanjiang, •P. Ziemann, J. Biskupek, and U. Kaiser
14:45 DS 11.4 Basics of the atomic layer deposition of HfO2 onto Si/SiO2 substrates: in-situ investigations with XPS, XAS and UHV-AFM — •Massimo Tallarida, Konstantin Karavaev, Krzysztof Kolanek, and Dieter Schmeisser
15:00 DS 11.5 Evolution of the interfacial layer during the atomic layer deposition of HfO2 on Si/SiO2 substrates — •Konstantin Karavaev, Massimo Tallarida, and Dieter Schmeisser
15:15 DS 11.6 In-situ investigations of the atomic layer deposition of HfO2 with UHV/AFM — •Krzysztof Kolanek, Konstantin Karavaev, Massimo Tallarida, and Dieter Schmeisser
15:30 DS 11.7 Pattern Formation in Langmuir-Blodgett Transfer Systems — •Michael Hubert Köpf and Rudolf Friedrich
15:45 DS 11.8 Wachstum dünner Ni63Al37-Legierungsschichten auf Cu(001) — •Wolfgang Donner und Noureddine Anibou
100% | Mobil-Ansicht | English Version | Kontakt/Impressum/Datenschutz
DPG-Physik > DPG-Verhandlungen > 2009 > Dresden