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Regensburg 2022 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 12: Quantum Dots and Wires 3: Growth

Dienstag, 6. September 2022, 09:30–12:45, H32

09:30 HL 12.1 Hauptvortrag: Wafer-Scale Epitaxial Modulation of Quantum Dot Densitiy — •Nikolai Bart, Christian Dangel, Peter Zajac, Nikolai Spitzer, Marcel Schmidt, Kai Müller, Andreas D. Wieck, Jonathan Finley, and Arne Ludwig
10:00 HL 12.2 Full Wafer Property Control of Local Droplet Etched GaAs Quantum Dots — •Hans-Georg Babin, Nikolai Bart, Marcel Schmidt, Nikolai Spitzer, Andreas D. Wieck, and Arne Ludwig
10:15 HL 12.3 Towards MOVPE-grown c-band emitting InAs quantum dots on a Si (001) substrate based on heterogeneous integration of membrane and epitaxial regrowth — •Ponraj Vijayan, Robert Sittig, Simone Luca Portalupi, Michael Jetter, and Peter Michler
10:30 HL 12.4 Non-vapor-liquid-solid selective area epitaxy of GaAs1-xSbx nanowires on siliconAkhil Ajay, Hyowon Jeong, •Haiting Yu, Nitin Mukhundhan, Tobias Schreitmüller, Markus Döblinger, and Gregor Koblmüller
10:45 HL 12.5 Epitaxial growth and characterization of multilayer site-controlled InGaAs quantum dots based on the buried stressor method — •Imad Limame, Ching-Wen Shih, Alexej Koltchanov, Moritz Plattner, Johannes Shall, Sven Rodt, and Stephan Reitzenstein
  11:00 30 min. break
11:30 HL 12.6 Growth of shallow GaAs quantum dots and investigation of their optical properties — •Moritz Langer, Nand Lal Sharma, Ghata Satish Bhayani, Ankita Choudhary, Oliver G. Schmidt, and Caspar Hopfmann
11:45 HL 12.7 Local droplet etching on InAlAs/InP surfaces with InAl droplets — •Yiteng Zhang, Xin Cao, Chenxi Ma, Yinan Wang, Benedikt Brechtken, Rolf J. Haug, Eddy P. Rugeramigabo, Michael Zopf, and Fei Ding
  12:00 HL 12.8 The contribution has been withdrawn.
  12:15 HL 12.9 The contribution has been withdrawn.
12:30 HL 12.10 Surface quantum dots with pure, coherent, and blinking-free single photon emission — •Michael Zopf, Xin Cao, Jingzhong Yang, Pengji Li, Tom Fandrich, Eddy P. Rugeramigabo, Chenxi Ma, Robert Keil, Frederik Benthin, Benedikt Brechtken, Rolf J. Haug, Yiteng Zhang, Susanne Woche, Zhao An, Constantin Schmidt, and Fei Ding
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